Process for processing surface plasmon polariton coupled nano array based on scallop effect

The invention discloses a method for preparing a surface plasmon polariton coupled nano array. The method comprises the following steps: performing deep reactive ion etching on a substrate by adopting a nano-scale etching mask which is manufactured by electron beam exposure, and then performing metallic membrane plating to obtain a three-dimensional 'metal nano structure array-nano space layer-metallic film' structure. The metallic nano structure generates local electromagnetic field resonance of photon and free electron to generate a very strong local surface plasmon polariton, and a diffraction effect provides wave vector compensation to excite a propagating type surface plasmon polariton of the metallic film so as to form local surface plasmon polariton-propagating type surface plasmon polariton coupling, so that light is restrained in a nano scale to initiate very strong surface local near field enhancement between a metal and a medium interface. The structure manufactured by the process disclosed by the invention can promote new mechanism exploration of the surface plasmon polariton, and has important application prospects in the fields of metamaterials, ultrahigh-sensitivity optical biosensing and the like.