Semiconductor device

The semiconductor device includes a bit line, a word line intersecting the bit line, a plurality of first contact patterns, and a plurality of second contact patterns. The word line extends so as to intersect the bit line in plan view. Each of the first contact patterns is elongated in the direction in which the bit line extends in plan view. Each of the second contact patterns is elongated in directions inclined with respect to the respective directions in which the bit line and the word line extend in plan view. The first contact patterns and the second contact patterns are formed in the same layer over the main surface of a semiconductor substrate.