Etching agent composition used for forming silver or silver alloy wire and reflection layer

The invention discloses an etching agent composition used for etching of a single-layer film or a multiple-layer film which contains silver or silver alloy and is used for a metal wire or a reflection layer of a thin film transistor. The etching agent composition comprises, based on the total weight...

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Bibliographische Detailangaben
Hauptverfasser:	LEE, SUCK-JUN, SHIM, KYUNG-BO, JANG, SANG-HOON, KIM, TAE-WAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The invention discloses an etching agent composition used for etching of a single-layer film or a multiple-layer film which contains silver or silver alloy and is used for a metal wire or a reflection layer of a thin film transistor. The etching agent composition comprises, based on the total weight of the composition, 55%-65% by weight of phosphoric acid, 2-10% by weight of nitric acid, 3-10% by weight of acetic acid, and 0.1%-5% by weight of sylvine, with the balance being water.