Etching fluid, etching force recovery agent, method for manufacturing semiconductor substrate for solar cell, and semiconductor substrate for solar cell

In the present invention, an alkaline etching fluid which contains at least one selected from a specified sulfonic acid compound or salt thereof, and silicic acid and/or a silicate, is used to process the surface of a semiconductor substrate for a solar cell. The sulfonic acid compound of the presen...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KAMADA YOSHITERU, YONEDA TERUMASA, SAIDA TOSHINORI, YOKOTA YUKINAGA, OOYAGI NOBORU
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
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Beschreibung
Zusammenfassung:	In the present invention, an alkaline etching fluid which contains at least one selected from a specified sulfonic acid compound or salt thereof, and silicic acid and/or a silicate, is used to process the surface of a semiconductor substrate for a solar cell. The sulfonic acid compound of the present invention is preferably p-toluenesulfonic acid.