Display device, method for manufacturing same, polyimide film for display device supporting bases, and method for producing polyimide film for display device supporting bases

Provided is a display device which can be formed thin, lightweight and flexible, while being free from the problems of cracks and separation due to thermal stress and having excellent dimensional stability and the like. A display device which comprises a gas barrier layer on a supporting base that i...

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Bibliographische Detailangaben
Hauptverfasser:	KATAYAMA MASAKAZU, OKAZAKI NATSUKO, HIRAISHI KATSUFUMI, WANG HONGYUAN, SUTO YOSHIKI
Format:	Patent
Sprache:	eng
Schlagworte:	ADVERTISING AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON CRYPTOGRAPHY DISPLAY DISPLAYING EDUCATION ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL PROCESSES OF COMPOUNDING LABELS OR NAME-PLATES LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICS SEALS SIGNS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING-UP
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Beschreibung
Zusammenfassung:	Provided is a display device which can be formed thin, lightweight and flexible, while being free from the problems of cracks and separation due to thermal stress and having excellent dimensional stability and the like. A display device which comprises a gas barrier layer on a supporting base that is formed of a polyimide film, and which is characterized in that: the polyimide film has a transmittance of 80% or more within the wavelength range from 440 nm to 780 nm and a thermal expansion coefficient of 15 ppm/K or less; and the difference between the thermal expansion coefficient of the polyimide film and the thermal expansion coefficient of the gas barrier layer is 10 ppm/K or less.