Method for rapid preparation of high-purity yttrium oxide coating for plasma etching machine

The invention discloses a method for rapid preparation of a high-purity yttrium oxide coating for a plasma etching machine. The method comprises the following steps: 1) preprocessing the surface of a part to be sprayed and protecting a coating-free region with an adhesive tape; 2) adopting high-purity yttrium oxide powder produced by Beijing General Research Institute of Mining and Metallurgy (or withmequal performance parameter), wherein the purity of the yttrium oxide powder is more than or equal to 99.9% and grain distribution is 20-40 microns; and 3) rapidly spraying by virtue of a scheme combining a tri-anode plasma spraying system and a multi-shaft manipulator. Compared with a conventional plasma spraying method, by adopting the spraying method disclosed by the invention, the heat input of a substrate (substrate temperature is less than 100 DEG C) is effectively reduced and the purity and uniformity of the coating is improved; the high-purity yttrium oxide ceramic coating which is 120-180 microns thick and is more than or equal to 99% in purity can be rapidly prepared within 1-2min; and high-energy plasma erosion resistance and service life of an etching machine part of a large scale integrated circuit are enhanced.