Positioning system, lithographic apparatus and device manufacturing method

There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system comprises a support (210), a position measurement device, a deformation sensor (250; DS) and a processor (PU). The support is constructed to hold the object. The position measurement...

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Hauptverfasser: JEUNINK ANDRE BERNARDUS, BEERENS RUUD ANTONIUS CATHARINA MARIA, VAN LIESHOUT RICHARD HENRICUS ADRIANUS, VAN DE WAL MARINUS MARIA JOHANNES, AANGENENT WILHELMUS HENRICUS THEODORUS MARIA, VAN DER HOEVEN SAARTJE WILLEMIJN, VAN DE GROES HENRICUS MARTINUS JOHANNES
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creator JEUNINK ANDRE BERNARDUS
BEERENS RUUD ANTONIUS CATHARINA MARIA
VAN LIESHOUT RICHARD HENRICUS ADRIANUS
VAN DE WAL MARINUS MARIA JOHANNES
AANGENENT WILHELMUS HENRICUS THEODORUS MARIA
VAN DER HOEVEN SAARTJE WILLEMIJN
VAN DE GROES HENRICUS MARTINUS JOHANNES
description There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system comprises a support (210), a position measurement device, a deformation sensor (250; DS) and a processor (PU). The support is constructed to hold the object. The position measurement device configured to measure a position of the support. The position measurement device comprises at least one position sensor target (100.1, 100.2, 100.3) and a plurality of position sensors (200.1, 200.2; SA) to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal (S) representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Positioning system, lithographic apparatus and device manufacturing method
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