Positioning system, lithographic apparatus and device manufacturing method

There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system comprises a support (210), a position measurement device, a deformation sensor (250; DS) and a processor (PU). The support is constructed to hold the object. The position measurement...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	JEUNINK ANDRE BERNARDUS, BEERENS RUUD ANTONIUS CATHARINA MARIA, VAN LIESHOUT RICHARD HENRICUS ADRIANUS, VAN DE WAL MARINUS MARIA JOHANNES, AANGENENT WILHELMUS HENRICUS THEODORUS MARIA, VAN DER HOEVEN SAARTJE WILLEMIJN, VAN DE GROES HENRICUS MARTINUS JOHANNES
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system comprises a support (210), a position measurement device, a deformation sensor (250; DS) and a processor (PU). The support is constructed to hold the object. The position measurement device configured to measure a position of the support. The position measurement device comprises at least one position sensor target (100.1, 100.2, 100.3) and a plurality of position sensors (200.1, 200.2; SA) to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal (S) representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.