Apparatus for processing microelectronic workpiece
The present invention provides an apparatus for processing a microelectronic workpiece, comprising: a) a spraying mechanism that dispenses a spray onto the workpiece, and b) a barrier plate overlying the workpiece, said barrier plate comprising at least one aperture through which the spray is dispen...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | The present invention provides an apparatus for processing a microelectronic workpiece, comprising: a) a spraying mechanism that dispenses a spray onto the workpiece, and b) a barrier plate overlying the workpiece, said barrier plate comprising at least one aperture through which the spray is dispensed toward the workpiece, wherein the spraying mechanism and the barrier plate are separate components. |
|---|