Oval double-layer silica crucible and preparation method thereof

The invention relates to an oval double-layer silica crucible which is formed by combining an outer crucible and an inner crucible together, wherein the inner crucible is arranged in the outer crucible; the distance between the outer crucible and the inner crucible is 4-8mm; the vertical sections of...

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1. Verfasser: TANG XIUYUN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention relates to an oval double-layer silica crucible which is formed by combining an outer crucible and an inner crucible together, wherein the inner crucible is arranged in the outer crucible; the distance between the outer crucible and the inner crucible is 4-8mm; the vertical sections of the outer crucible and the inner crucible are isosceles trapezoids; openings positioned at the tops of the outer crucible and the inner crucible and the bottoms of the outer crucible and the inner crucible are all oval, and the ellipticity is 50%. Compared with the prior art, the oval double-layer silica crucible disclosed by the invention has the beneficial effects that slip casting and fettling can be carried out easily due to small size; a firing size is small and a finished product is easily formed once because an oval silica crucible blank is small in size; two oval silica crucibles of different sizes and types are obtained through two-time blank firing, an oval double-layer silica crucible original creation