Measuring system for measuring an imaging quality of an EUV lens

A measuring system (10) for measuring an imaging quality of an EUV lens (30) comprises: a diffractive test structure (26), a measurement light radiating device (16) which is configured to radiate measurement light (21) in the EUV wavelength range onto the test structure, a variation device (28) for...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	DEGUENTHER MARKUS, HAIDNER HELMUT, FRESE RALF, SCHRIEVER MARTIN, SAMANIEGO MICHAEL, HOCH RAINER
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A measuring system (10) for measuring an imaging quality of an EUV lens (30) comprises: a diffractive test structure (26), a measurement light radiating device (16) which is configured to radiate measurement light (21) in the EUV wavelength range onto the test structure, a variation device (28) for varying at least one image-determining parameter of an imaging of the test structure that is effected by means of a lens, a detector (14) for recording an image stack comprising a plurality of images generated with different image-determining parameters being set, and an evaluation device (15) which is configured to determine the imaging quality of the lens from the image stack.