Photocurable composition, barrier layer including same, and encapsulated device including same

Photocurable composition, barrier layer including same, and encapsulated device including same

The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer (A) and a silicon-containing monomer (B), wherein the silicon-containing monomer (B) has a structure...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: CUI CHENGJI, QUAN ZHIHUI, LI LIANZHU, HE JINGZHEN, LI CHANGMIN
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator CUI CHENGJI
QUAN ZHIHUI
LI LIANZHU
HE JINGZHEN
LI CHANGMIN
description The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer (A) and a silicon-containing monomer (B), wherein the silicon-containing monomer (B) has a structure according to formula 1.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN104204950A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN104204950A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN104204950A3</originalsourceid><addsrcrecordid>eNqNyj0PAUEQgOFrFIL_MPqTLE6hlAtRiULtMrc7mGRvZrMfEv-eQqXSvG_zjKvr-aFZbYnYewKrQ9DEmVVq6DFGpggeX5-yWF8cyx0SDlQDigMSiyEVj5kcOHqypR83rUY39Ilm30-q-WF_aY8LCtpRCmhJKHftaWmalWm2G7Nb_2Peco080Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Photocurable composition, barrier layer including same, and encapsulated device including same</title><source>esp@cenet</source><creator>CUI CHENGJI ; QUAN ZHIHUI ; LI LIANZHU ; HE JINGZHEN ; LI CHANGMIN</creator><creatorcontrib>CUI CHENGJI ; QUAN ZHIHUI ; LI LIANZHU ; HE JINGZHEN ; LI CHANGMIN</creatorcontrib><description>The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer (A) and a silicon-containing monomer (B), wherein the silicon-containing monomer (B) has a structure according to formula 1.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20141210&amp;DB=EPODOC&amp;CC=CN&amp;NR=104204950A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20141210&amp;DB=EPODOC&amp;CC=CN&amp;NR=104204950A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CUI CHENGJI</creatorcontrib><creatorcontrib>QUAN ZHIHUI</creatorcontrib><creatorcontrib>LI LIANZHU</creatorcontrib><creatorcontrib>HE JINGZHEN</creatorcontrib><creatorcontrib>LI CHANGMIN</creatorcontrib><title>Photocurable composition, barrier layer including same, and encapsulated device including same</title><description>The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer (A) and a silicon-containing monomer (B), wherein the silicon-containing monomer (B) has a structure according to formula 1.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyj0PAUEQgOFrFIL_MPqTLE6hlAtRiULtMrc7mGRvZrMfEv-eQqXSvG_zjKvr-aFZbYnYewKrQ9DEmVVq6DFGpggeX5-yWF8cyx0SDlQDigMSiyEVj5kcOHqypR83rUY39Ilm30-q-WF_aY8LCtpRCmhJKHftaWmalWm2G7Nb_2Peco080Q</recordid><startdate>20141210</startdate><enddate>20141210</enddate><creator>CUI CHENGJI</creator><creator>QUAN ZHIHUI</creator><creator>LI LIANZHU</creator><creator>HE JINGZHEN</creator><creator>LI CHANGMIN</creator><scope>EVB</scope></search><sort><creationdate>20141210</creationdate><title>Photocurable composition, barrier layer including same, and encapsulated device including same</title><author>CUI CHENGJI ; QUAN ZHIHUI ; LI LIANZHU ; HE JINGZHEN ; LI CHANGMIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN104204950A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>CUI CHENGJI</creatorcontrib><creatorcontrib>QUAN ZHIHUI</creatorcontrib><creatorcontrib>LI LIANZHU</creatorcontrib><creatorcontrib>HE JINGZHEN</creatorcontrib><creatorcontrib>LI CHANGMIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CUI CHENGJI</au><au>QUAN ZHIHUI</au><au>LI LIANZHU</au><au>HE JINGZHEN</au><au>LI CHANGMIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Photocurable composition, barrier layer including same, and encapsulated device including same</title><date>2014-12-10</date><risdate>2014</risdate><abstract>The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer (A) and a silicon-containing monomer (B), wherein the silicon-containing monomer (B) has a structure according to formula 1.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN104204950A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title Photocurable composition, barrier layer including same, and encapsulated device including same
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-10T06%3A44%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CUI%20CHENGJI&rft.date=2014-12-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN104204950A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true