Photocurable composition, barrier layer including same, and encapsulated device including same

The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer (A) and a silicon-containing monomer (B), wherein the silicon-containing monomer (B) has a structure...

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Bibliographische Detailangaben
Hauptverfasser:	CUI CHENGJI, QUAN ZHIHUI, LI LIANZHU, HE JINGZHEN, LI CHANGMIN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer (A) and a silicon-containing monomer (B), wherein the silicon-containing monomer (B) has a structure according to formula 1.