Method for preparing high-quality anti-position indium feed liquid by using complex indium copper enrichment residues
The invention discloses a method for preparing a high-quality anti-position indium feed liquid by using complex indium copper enrichment residues. The method comprises the following steps: washing indium copper enrichment residues in a weak acid, performing open leaching on arsenic, iron, tin, lead,...
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Format: | Patent |
Sprache: | chi ; eng |
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