Method for preparing high-quality anti-position indium feed liquid by using complex indium copper enrichment residues

The invention discloses a method for preparing a high-quality anti-position indium feed liquid by using complex indium copper enrichment residues. The method comprises the following steps: washing indium copper enrichment residues in a weak acid, performing open leaching on arsenic, iron, tin, lead,...

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Hauptverfasser: WU GUOQIN, LIAO FAZHONG, LU YONGSEN, HUANG CHANGYUAN, CHEN CHUNFA, PAN YUNPENG, WEI NAITUAN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a method for preparing a high-quality anti-position indium feed liquid by using complex indium copper enrichment residues. The method comprises the following steps: washing indium copper enrichment residues in a weak acid, performing open leaching on arsenic, iron, tin, lead, zinc, antimony, bismuth, silicon and thallium in the residues in an indium system, remaining indium and copper in the residues, and performing liquid-solid separation to obtain the filter residues; leaching the filter residues by using concentrated sulfuric acid, and performing liquid-solid separation to obtain copper residues and filtrate; performing extraction and reverse extraction on the filtrate to obtain an anti-position indium liquid; and converting the anti-position indium liquid by using coarse indium, performing displacement precipitation on impurity ions such as arsenic, iron, tin, lead, zinc, antimony, bismuth, silicon and thallium to enter the residues, and performing liquid-solid separation to obtain