Method for producing three-dimensional structures assembled with nanoparticles
The present invention relates to a method for producing three-dimensional structures assembled with nanoparticles using a pattern perforated mask. The present invention includes: (1) a step of forming an electric focusing lens by positioning a mask having a perforated pattern of predetermined width...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention relates to a method for producing three-dimensional structures assembled with nanoparticles using a pattern perforated mask. The present invention includes: (1) a step of forming an electric focusing lens by positioning a mask having a perforated pattern of predetermined width (w) a predetermined distance (d) away from a substrate to be patterned in a grounded reactor, and applying a voltage thereto on the substrate; and (2) a step of introducing electrically charged nanoparticles and guiding electrically charged particles to the substrate through the pattern of the mask so that the electrically charged nanoparticles are focused on and attached to the substrate in a three-dimensional shape. According to the present invention, three-dimensional structures of various shapes can be produced with high precision and efficiency without generating a noise pattern. |
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