Carbon Nanostructure Device Fabrication Utilizing Protect Layers

Hall effect devices and field effect transistors are formed incorporating a carbon-based nanostructure layer such as carbon nanotubes and/or graphene with a sacrificial metal layer formed there over to protect the carbon-based nanostructure layer during processing.

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: CHRISTOS D.DIMITRAKOPOULOS, ALFRED GRILL, KATHERINE L.SAENGER, DIRK PFEIFER, ROBERT L.WISNIEFF, JACK O.CHU, TIMOTHY J.MCARDLE
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Hall effect devices and field effect transistors are formed incorporating a carbon-based nanostructure layer such as carbon nanotubes and/or graphene with a sacrificial metal layer formed there over to protect the carbon-based nanostructure layer during processing.