Co-sputtering rotary target and preparation method thereof

The invention relates to the technical field of physical preparation of a film, and particularly relates to a co-sputtering rotary target and a preparation method thereof. The co-sputtering rotary target is characterized by comprising a rotary cylindrical target tube and a centralized actionless magnet, wherein for the rotary cylindrical target tube, doped component target units and body component target units with different shapes are distributed on a cylindrical support substrate in different manners, and both the doped component target units and the body component target units are distributed according to certain arrangement rules. According to the invention, the target units to be co-sputtered and the target units to be co-doped are manufactured into different shapes and are distributed on the cylindrical support substrate in different manners, and the actionless magnet is arranged at the center of the cylindrical support substrate, so that slow rotation realizes magnetron sputtering, thereby achieving th