Source/drain contacts for non-planar transistors

The present description relates to the field of fabricating microelectronic devices having non-planar transistors. Embodiments of the present description relate to the formation of source/drain contacts within non-planar transistors, wherein a titanium-containing contact interface may be used in the...

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Bibliographische Detailangaben
Hauptverfasser: CHUN JIN-SUNG, JOSHI SABHASH M, PRADHAN SAMEER S
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present description relates to the field of fabricating microelectronic devices having non-planar transistors. Embodiments of the present description relate to the formation of source/drain contacts within non-planar transistors, wherein a titanium-containing contact interface may be used in the formation of the source/drain contact with a discreet titanium silicide formed between the titanium-containing interface and a silicon-containing source/drain structure.