Dual single sided sputter chambers with sustaining heater

The invention relates to a disk processing system having a heater chamber and dual single-sided sputter chambers each with a sustaining heater.

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Bibliographische Detailangaben
Hauptverfasser: TATSURU TANAKA, HONGLING LIU, HUA YUAN, CHANG B. YI
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The invention relates to a disk processing system having a heater chamber and dual single-sided sputter chambers each with a sustaining heater.