Substrate drying method, substrate manufacturing method, and low-temperature heating drying device thereof
The invention discloses a substrate drying method, a substrate manufacturing method and a low-temperature heating drying device thereof. The substrate drying method is used after a film is formed through photoresist coating, and a low-temperature heating drying way is adopted. The substrate drying m...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention discloses a substrate drying method, a substrate manufacturing method and a low-temperature heating drying device thereof. The substrate drying method is used after a film is formed through photoresist coating, and a low-temperature heating drying way is adopted. The substrate drying method comprises the following steps that a substrate coated with the photoresist is conveyed to a cavity of the low-temperature heating drying device after the film is formed through photoresist coating, and the photoresist is volatilized through low-temperature heating drying in the cavity of the low-temperature heating drying device. According to the substrate drying method, the substrate manufacturing method and the low-temperature heating drying device thereof, the photoresist is volatilized, manufacturing cost and operation cost of equipment can be effectively reduced, and uneven conditions are reduced in the substrate drying process. |
---|