Substrate drying method, substrate manufacturing method, and low-temperature heating drying device thereof

The invention discloses a substrate drying method, a substrate manufacturing method and a low-temperature heating drying device thereof. The substrate drying method is used after a film is formed through photoresist coating, and a low-temperature heating drying way is adopted. The substrate drying m...

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Bibliographische Detailangaben
Hauptverfasser: GONG JINJIN, ZHU QIFENG, ZHANG WEITENG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a substrate drying method, a substrate manufacturing method and a low-temperature heating drying device thereof. The substrate drying method is used after a film is formed through photoresist coating, and a low-temperature heating drying way is adopted. The substrate drying method comprises the following steps that a substrate coated with the photoresist is conveyed to a cavity of the low-temperature heating drying device after the film is formed through photoresist coating, and the photoresist is volatilized through low-temperature heating drying in the cavity of the low-temperature heating drying device. According to the substrate drying method, the substrate manufacturing method and the low-temperature heating drying device thereof, the photoresist is volatilized, manufacturing cost and operation cost of equipment can be effectively reduced, and uneven conditions are reduced in the substrate drying process.