Method for manufacturing pattern structure
This method for manufacturing a pattern structure comprises a step for forming lift-off material (12) on a base material (10) by an inkjet method, a step for forming a functional film (14) on the base material and lift-off material by atomic layer deposition, and a step for forming a pattern from th...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | This method for manufacturing a pattern structure comprises a step for forming lift-off material (12) on a base material (10) by an inkjet method, a step for forming a functional film (14) on the base material and lift-off material by atomic layer deposition, and a step for forming a pattern from the functional film on the base material by eliminating the lift-off material by a lift-off method. |
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