Method for measuring residual stress in TSV copper column

The invention relates to the field of microelectronics, and discloses a method for measuring residual stress in a TSV copper column. The method comprises: determining a test origin point on the surface of a TSV cooper column requiring test; respectively preparing a set of the same micro labels in th...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: WANG JUN, XIAO FEI, ZHANG ZHAOQIANG, ZHAI XINDUO
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The invention relates to the field of microelectronics, and discloses a method for measuring residual stress in a TSV copper column. The method comprises: determining a test origin point on the surface of a TSV cooper column requiring test; respectively preparing a set of the same micro labels in three directions of the test origin point, wherein position relationships between the three sets of the micro labels and the test origin point are the same; perforating a micro hole on the test origin point position; detecting position changes of the three sets of the micro labels before and after perforating the micro hole; and calculating the residual stress of the test origin point through combining elasticity according to the position changes of the three sets of the micro labels. With the present invention, the test on the residual stress in the TSV copper column does not require a strain gage, and further does not require determination on roughness of the sample TSV copper column so as to reduce test requiremen