Magnetoresistance film and production method thereof
A production method of a magnetoresistance film includes forming an insulating material layer on a substrate; forming a trench in the insulating material layer; forming a first barrier layer on the bottom and the side wall of the trench as well as the surface of the insulating material layer; formin...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A production method of a magnetoresistance film includes forming an insulating material layer on a substrate; forming a trench in the insulating material layer; forming a first barrier layer on the bottom and the side wall of the trench as well as the surface of the insulating material layer; forming a second barrier layer, with the thickness smaller than that of the first barrier layer, on the first barrier layer; forming a magnetic material layer on the second barrier layer; performing annealing treatment on the magnetic material layer to form the magnetoresistance film. Besides, the invention further provides the magnetoresistance film. The magnetoresistance film comprises the insulating material layer with the trench, and the first barrier layer, the second barrier layer and the magnetic material layer arranged on the insulating material layer in sequence. The production method and the magnetoresistance film have the advantages that the second barrier layer is smoother in surface, so that subsequent forma |
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