Metallographic phase display method for double-layered metal material
The invention discloses a metallographic structure display method for a double-layered metal material. The metallographic structure display method comprises the following steps of: (1) cutting off one section from a double-layered metal material sample and taking the section as a test sample; (2) ca...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a metallographic structure display method for a double-layered metal material. The metallographic structure display method comprises the following steps of: (1) cutting off one section from a double-layered metal material sample and taking the section as a test sample; (2) carrying out grinding and polishing treatment on the outer surface of one layer of the test sample; (3) carrying out etching on the outer surface treated by the step (3); (4) taking a metallographic microscope to observe a metallographic structure of the outer surface treated by the step (3); and (5) repeatedly treating the other layer of the test sample in the step (1) according to the steps (2), (3) and (4). The method disclosed by the invention can finish detection and analysis on the metallographic structure of the double-layered material so that technical difficulties in the field are overcome. |
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