Heat treatment device
The invention provides a heat treatment device capable of suppressing non-uniform drying of coating film during heat treatment device. The heat treatment device comprises a plurality of vibration plate portions (2) parallelly arranged on the direction for conveying substrates (W), an ultrasonic gene...
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| creator | MIYAJIMA YUYA |
| description | The invention provides a heat treatment device capable of suppressing non-uniform drying of coating film during heat treatment device. The heat treatment device comprises a plurality of vibration plate portions (2) parallelly arranged on the direction for conveying substrates (W), an ultrasonic generation portion (4) applying ultrasonic vibration on vibration plate portions (2), and a temperature control portion which controls the temperature of predetermined vibration plate portions (2) to a preset temperature. When the substrates (W) are carried by ultrasonic vibration suspension, and the substrates are subjected to heat processing, wherein partial or all vibration plate portions (2) are provided with a gas floating portion for floating the substrates (W) through gas ejection. |
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The heat treatment device comprises a plurality of vibration plate portions (2) parallelly arranged on the direction for conveying substrates (W), an ultrasonic generation portion (4) applying ultrasonic vibration on vibration plate portions (2), and a temperature control portion which controls the temperature of predetermined vibration plate portions (2) to a preset temperature. When the substrates (W) are carried by ultrasonic vibration suspension, and the substrates are subjected to heat processing, wherein partial or all vibration plate portions (2) are provided with a gas floating portion for floating the substrates (W) through gas ejection.</description><language>chi ; eng</language><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; PERFORMING OPERATIONS ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130918&DB=EPODOC&CC=CN&NR=103302009A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130918&DB=EPODOC&CC=CN&NR=103302009A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYAJIMA YUYA</creatorcontrib><title>Heat treatment device</title><description>The invention provides a heat treatment device capable of suppressing non-uniform drying of coating film during heat treatment device. The heat treatment device comprises a plurality of vibration plate portions (2) parallelly arranged on the direction for conveying substrates (W), an ultrasonic generation portion (4) applying ultrasonic vibration on vibration plate portions (2), and a temperature control portion which controls the temperature of predetermined vibration plate portions (2) to a preset temperature. When the substrates (W) are carried by ultrasonic vibration suspension, and the substrates are subjected to heat processing, wherein partial or all vibration plate portions (2) are provided with a gas floating portion for floating the substrates (W) through gas ejection.</description><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBD1SE0sUSgpApK5qXklCimpZZnJqTwMrGmJOcWpvFCam0HRzTXE2UM3tSA_PrW4IDE5NS-1JN7Zz9DA2NjAyMDA0tGYGDUAZo0g5g</recordid><startdate>20130918</startdate><enddate>20130918</enddate><creator>MIYAJIMA YUYA</creator><scope>EVB</scope></search><sort><creationdate>20130918</creationdate><title>Heat treatment device</title><author>MIYAJIMA YUYA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN103302009A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2013</creationdate><topic>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>MIYAJIMA YUYA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIYAJIMA YUYA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Heat treatment device</title><date>2013-09-18</date><risdate>2013</risdate><abstract>The invention provides a heat treatment device capable of suppressing non-uniform drying of coating film during heat treatment device. The heat treatment device comprises a plurality of vibration plate portions (2) parallelly arranged on the direction for conveying substrates (W), an ultrasonic generation portion (4) applying ultrasonic vibration on vibration plate portions (2), and a temperature control portion which controls the temperature of predetermined vibration plate portions (2) to a preset temperature. When the substrates (W) are carried by ultrasonic vibration suspension, and the substrates are subjected to heat processing, wherein partial or all vibration plate portions (2) are provided with a gas floating portion for floating the substrates (W) through gas ejection.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN103302009A |
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| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | Heat treatment device |
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