Heat treatment device

The invention provides a heat treatment device capable of suppressing non-uniform drying of coating film during heat treatment device. The heat treatment device comprises a plurality of vibration plate portions (2) parallelly arranged on the direction for conveying substrates (W), an ultrasonic gene...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	MIYAJIMA YUYA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention provides a heat treatment device capable of suppressing non-uniform drying of coating film during heat treatment device. The heat treatment device comprises a plurality of vibration plate portions (2) parallelly arranged on the direction for conveying substrates (W), an ultrasonic generation portion (4) applying ultrasonic vibration on vibration plate portions (2), and a temperature control portion which controls the temperature of predetermined vibration plate portions (2) to a preset temperature. When the substrates (W) are carried by ultrasonic vibration suspension, and the substrates are subjected to heat processing, wherein partial or all vibration plate portions (2) are provided with a gas floating portion for floating the substrates (W) through gas ejection.