Method for forming vapor deposition film, and method for producing display device

On the surface of a substrate (3) on which a vapor deposition firm is to be formed, photoresist (13) is formed so as to have an opening in the sealed region formed by sealing resin (11) in a pane shape including a display area (R1). Subsequently, light-emitting layers (8R, 8G, 8B) having striped pat...

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Bibliographische Detailangaben
Hauptverfasser:	JING SHANGZHI, HASHIMOTO SATOSHI, SONODA TOHRU, KAWATO SHINICHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADVERTISING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CRYPTOGRAPHY DIFFUSION TREATMENT OF METALLIC MATERIAL DISPLAY DISPLAYING EDUCATION ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LABELS OR NAME-PLATES METALLURGY PHYSICS SEALS SIGNS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	On the surface of a substrate (3) on which a vapor deposition firm is to be formed, photoresist (13) is formed so as to have an opening in the sealed region formed by sealing resin (11) in a pane shape including a display area (R1). Subsequently, light-emitting layers (8R, 8G, 8B) having striped patterns are formed, after which photoresist (13) is removed using a release solution, to form light-emitting layers (8R, 8G, 8B) with high-definition patterning.