Lens heating aware source mask optimization for advanced lithography
A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality...
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| creator | VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA HUANG WENJIN LIU HUA YU LIU PENG JIANG AIQIN CROUSE MICHAEL MATTHEW |
| description | A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN103246175A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN103246175A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN103246175A3</originalsourceid><addsrcrecordid>eNrjZHDxSc0rVshITSzJzEtXSCxPLEpVKM4vLUpOVchNLM5WyC8oyczNrAJK5-cppOUXKSSmlCXmJaemKORklmTkpxclFmRU8jCwpiXmFKfyQmluBkU31xBnD93Ugvz41OKCxOTUvNSSeGc_QwNjIxMzQ3NTR2Ni1AAA3CEzMw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lens heating aware source mask optimization for advanced lithography</title><source>esp@cenet</source><creator>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ; HUANG WENJIN ; LIU HUA YU ; LIU PENG ; JIANG AIQIN ; CROUSE MICHAEL MATTHEW</creator><creatorcontrib>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ; HUANG WENJIN ; LIU HUA YU ; LIU PENG ; JIANG AIQIN ; CROUSE MICHAEL MATTHEW</creatorcontrib><description>A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CALCULATING ; CINEMATOGRAPHY ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130814&DB=EPODOC&CC=CN&NR=103246175A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130814&DB=EPODOC&CC=CN&NR=103246175A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA</creatorcontrib><creatorcontrib>HUANG WENJIN</creatorcontrib><creatorcontrib>LIU HUA YU</creatorcontrib><creatorcontrib>LIU PENG</creatorcontrib><creatorcontrib>JIANG AIQIN</creatorcontrib><creatorcontrib>CROUSE MICHAEL MATTHEW</creatorcontrib><title>Lens heating aware source mask optimization for advanced lithography</title><description>A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CALCULATING</subject><subject>CINEMATOGRAPHY</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDxSc0rVshITSzJzEtXSCxPLEpVKM4vLUpOVchNLM5WyC8oyczNrAJK5-cppOUXKSSmlCXmJaemKORklmTkpxclFmRU8jCwpiXmFKfyQmluBkU31xBnD93Ugvz41OKCxOTUvNSSeGc_QwNjIxMzQ3NTR2Ni1AAA3CEzMw</recordid><startdate>20130814</startdate><enddate>20130814</enddate><creator>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA</creator><creator>HUANG WENJIN</creator><creator>LIU HUA YU</creator><creator>LIU PENG</creator><creator>JIANG AIQIN</creator><creator>CROUSE MICHAEL MATTHEW</creator><scope>EVB</scope></search><sort><creationdate>20130814</creationdate><title>Lens heating aware source mask optimization for advanced lithography</title><author>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ; HUANG WENJIN ; LIU HUA YU ; LIU PENG ; JIANG AIQIN ; CROUSE MICHAEL MATTHEW</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN103246175A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2013</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CALCULATING</topic><topic>CINEMATOGRAPHY</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA</creatorcontrib><creatorcontrib>HUANG WENJIN</creatorcontrib><creatorcontrib>LIU HUA YU</creatorcontrib><creatorcontrib>LIU PENG</creatorcontrib><creatorcontrib>JIANG AIQIN</creatorcontrib><creatorcontrib>CROUSE MICHAEL MATTHEW</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA</au><au>HUANG WENJIN</au><au>LIU HUA YU</au><au>LIU PENG</au><au>JIANG AIQIN</au><au>CROUSE MICHAEL MATTHEW</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lens heating aware source mask optimization for advanced lithography</title><date>2013-08-14</date><risdate>2013</risdate><abstract>A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lens heating aware source mask optimization for advanced lithography |
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