Lens heating aware source mask optimization for advanced lithography

A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality...

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Bibliographische Detailangaben
Hauptverfasser: VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA, HUANG WENJIN, LIU HUA YU, LIU PENG, JIANG AIQIN, CROUSE MICHAEL MATTHEW
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.