Technology and device for surface treatment and corrosion of silicon slice surface sample preparation

Disclosed are a technology for surface treatment and corrosion of silicon slice surface sample preparation and a device for the surface treatment and corrosion of the silicon slice surface sample preparation. The technology contains a process that ozone enters into a sealed corrosion cavity to conta...

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Bibliographische Detailangaben
Hauptverfasser: SHENG FANGYU, FENG QUANLIN, YAN ZHIRUI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Disclosed are a technology for surface treatment and corrosion of silicon slice surface sample preparation and a device for the surface treatment and corrosion of the silicon slice surface sample preparation. The technology contains a process that ozone enters into a sealed corrosion cavity to contact with the surface of a silicon slice, so that the surface of the silicon slice is oxidized into a dense oxidation film. The device comprises the corrosion cavity (1) and a cover shade (2), wherein the cavity is provided with a silicon slice platform (4), an ozone or nitrogen leading inlet (1-1), an HF gas inlet (1-2) with nitrogen as a carrier, and an air discharge port (1-4), and further comprises an externally-arranged HF container (5). The ozone or nitrogen leading inlet (1-1) is in series connection with a valve V2 and a flow adjusting valve MFC1, the other end of the MFC1 is connected with a tee joint, one end of the tee joint is connected with a nitrogen pipeline, and the other end of the tee joint is conne