Technology and device for surface treatment and corrosion of silicon slice surface sample preparation
Disclosed are a technology for surface treatment and corrosion of silicon slice surface sample preparation and a device for the surface treatment and corrosion of the silicon slice surface sample preparation. The technology contains a process that ozone enters into a sealed corrosion cavity to conta...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Disclosed are a technology for surface treatment and corrosion of silicon slice surface sample preparation and a device for the surface treatment and corrosion of the silicon slice surface sample preparation. The technology contains a process that ozone enters into a sealed corrosion cavity to contact with the surface of a silicon slice, so that the surface of the silicon slice is oxidized into a dense oxidation film. The device comprises the corrosion cavity (1) and a cover shade (2), wherein the cavity is provided with a silicon slice platform (4), an ozone or nitrogen leading inlet (1-1), an HF gas inlet (1-2) with nitrogen as a carrier, and an air discharge port (1-4), and further comprises an externally-arranged HF container (5). The ozone or nitrogen leading inlet (1-1) is in series connection with a valve V2 and a flow adjusting valve MFC1, the other end of the MFC1 is connected with a tee joint, one end of the tee joint is connected with a nitrogen pipeline, and the other end of the tee joint is conne |
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