Mask alignment optical system

The present invention provides a mask alignment optical system where a transparent illumination method is utilized and which is excellent in performance and can effectively use a mask. The mask alignment optical system aligns a metal mask (102) with a substrate (6), and is provided with a fixed fram...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: JUNG JAE HOON, KAMEYAMA HIROKI, MATSUMOTO FUSASHIGE, LEE SANG WOO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention provides a mask alignment optical system where a transparent illumination method is utilized and which is excellent in performance and can effectively use a mask. The mask alignment optical system aligns a metal mask (102) with a substrate (6), and is provided with a fixed frame (101) and a carrying platform (201), wherein the fixed frame (101) is formed around the metal mask with L-shaped light guide paths forming at the four corners, and the carrying platform (201) carries the substrate on the surface with light guide paths forming at the four corners. Alignment with the metal mask is performed by using transmission images of alignment marks formed by light guided into the light guide paths formed on part of the fixed frame and the light guide paths formed on part of the carrying platform.