Thin metal film transfer material and production method of same

Disclosed is a thin metal film transfer material provided with an insulating metal film which exhibits sufficient electromagnetic wave transmission characteristics and insulation characteristics and exhibits high resistance to corrosion such as oxidation or hydroxylation while maintaining a good met...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: TANAKA NORIO, TSUTSUMIDA YUJI, IIJIMA TOSHIKAZU, NAKANO SHIGERU
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Disclosed is a thin metal film transfer material provided with an insulating metal film which exhibits sufficient electromagnetic wave transmission characteristics and insulation characteristics and exhibits high resistance to corrosion such as oxidation or hydroxylation while maintaining a good metallic appearance. The thin metal film transfer material is either a material obtained by stacking a resin release layer, a resin protective layer, an insulating thin metal film layer and an adhesive layer in that order on at least one surface of a transparent base film, in which case the thickness (X) of the insulating thin metal film layer is 5-100 nm and the total light transmittance (Tr) (%) of the material satisfies the equation Tr >= 87.522 x Exp (-0.0422*X), or is a material obtained by stacking a resin release layer, a resin protective layer, a thin metal film layer, an insulating thin metal film layer and an adhesive layer in that order on at least one surface of a transparent base film, in which case the t