Method for preparing nickel-doped bismuth silicon oxide microspheres by ultrasonic spray

The invention relates to a method for preparing nickel-doped bismuth silicon oxide microspheres by ultrasonic spray. The diameter of each nickel-doped bismuth silicon oxide microsphere ranges from 100nm to 10 micrometers, and the doping ratio of nickel is 10% of the molar weight of bismuth silicon oxide. The method includes using trivalent bismuth salt, tetraethyl orthosilicate and nickel nitrate hexahydrate as raw materials; adding a define amount of surfactant into the raw materials; and preparing the nickel-doped bismuth silicon oxide microspheres by a spray pyrolysis at the temperature ranging from 500 DEG C to 800 DEG C. A nickel-doped bismuth silicon oxide material synthesized by the method is high in purity, is of microsphere structures, is extremely high in visible-light photocatalytic activity, and can be used in the field of environmental pollution treatment. The method has the advantages that a process is simple, conditions are controlled easily, requirements on equipment are low, cost is also low,