Method for the removal of deposition, method for the protection of an optical element, device manufacturing method, and lithographic apparatus

A method for the removal of a deposition on an optical element of an apparatus including the optical clement includes producing hydrogen radicals from H 2 from an H 2 -containing gas and bringing the optical clement with deposition into contact with at least part of the hydrogen radicals and removin...

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Bibliographische Detailangaben
Hauptverfasser:	VAN HERPEN MAARTEN MARINUS JOH, BANINE VADIM Y, KLUNDER DERK JAN W, MOORS JOHANNES HUBERTUS J, SPEE CAROLUS IDA M A, ZALM PETER CORNELIS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method for the removal of a deposition on an optical element of an apparatus including the optical clement includes producing hydrogen radicals from H 2 from an H 2 -containing gas and bringing the optical clement with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical clement includes providing a cap layer to the optical element by a deposition process and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The hydrogen radicals are generated from H 2 from the H 2 containing gas by a filament, radiation, or a catalyst configured to convert H 2 into hydrogen radicals.