Glass paste for forming a photosensitive sealing layer, plasma display manufacturing method using the same, and plasma display

Disclosed is a photosensitive paste including (A) a glass powder with a glass transition point of 410-480 DEG C, a yield point of 470-510 DEG C, and a softening point of 515-550 DEG C; (B) a photosensitive organic component; (C) a UV absorber; and (D) a solvent. The glass paste for forming a photose...

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Bibliographische Detailangaben
Hauptverfasser:	TANAKA AKIHIKO, IDO HIDEO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	Disclosed is a photosensitive paste including (A) a glass powder with a glass transition point of 410-480 DEG C, a yield point of 470-510 DEG C, and a softening point of 515-550 DEG C; (B) a photosensitive organic component; (C) a UV absorber; and (D) a solvent. The glass paste for forming a photosensitive sealing layer is characterized in that the inorganic component including the glass powder has an average refractive index (N1) fulfilling equation (1): 1.75