System for creating layout pattern for manufacturing mask rom, mask rom manufactured by using the system, and method for creating mask pattern

System for creating layout pattern for manufacturing mask rom, mask rom manufactured by using the system, and method for creating mask pattern

When creating a temporary ROM code file (24) and a design information file (26), a host server (SRV) generates a dedicated ROM compiler (22) and an intermediate file (28) correlated with the dedicated ROM compiler (22). In a work station (WS), the dedicated ROM compiler (22) is executed so that the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TSUKAMOTO MICHIKO, NAKAJIMA TAKASHI, MIYANISHI ATSUSHI
Format: Patent
Sprache:chi ; eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Beschreibung
Zusammenfassung:When creating a temporary ROM code file (24) and a design information file (26), a host server (SRV) generates a dedicated ROM compiler (22) and an intermediate file (28) correlated with the dedicated ROM compiler (22). In a work station (WS), the dedicated ROM compiler (22) is executed so that the content of the design information file (46) is modified so as to satisfy a correct ROM code. The dedicated ROM compiler (22) can modify only a particular design parameter (32) and a design information file (26) correlated to the temporary ROM code file (24).