Line structure, roller with line and formation method thereof

The invention relates to a line structure, a roller with lines and a formation method thereof. The line structure comprises a body, an adhesive surface and an ultraviolet photoresist line surface. The adhesive surface is arranged on one side of the body and has an adhesive property to an element mad...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ZHANG JIAWEI, DING QIXIU, SHI JIASHENG, CAO WEITENG, CHEN YIJING, ZHANG YINGYUE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a line structure, a roller with lines and a formation method thereof. The line structure comprises a body, an adhesive surface and an ultraviolet photoresist line surface. The adhesive surface is arranged on one side of the body and has an adhesive property to an element made of any one or combination of metal, alloy, glass and quartz. The ultraviolet photoresist line surface is arranged on the other side of the body and is opposite to the adhesive surface. The cured ultraviolet photoresist line surface has a release property to other ultraviolet photoresists. The line structure and the roller are simple to produce. When the line structure and the roller are used for the mass production of line products, the rate of defect-free products can be improved.