Diazoresin, photosensitive resin composition and photosensitive film for screen plate
The invention provides diazoresin which can be applied to a photosensitive film with superior aging stability and wide exposure latitude, and a photosensitive resin composition and the photosensitive film using the diazoresin. The diazoresin can be obtained by condensing a water-soluble salt of subs...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides diazoresin which can be applied to a photosensitive film with superior aging stability and wide exposure latitude, and a photosensitive resin composition and the photosensitive film using the diazoresin. The diazoresin can be obtained by condensing a water-soluble salt of substitutable 4-diazodiphenylamine and formaldehyde in the presence of mixed acid consisting of sulfuric acid and phosphoric acid. The invention also relates to the photosensitive resin composition, which is formed by dispersing at least one of an oil-soluble photopolymerization initiator, mixture of water-insoluble or insoluble compounds with at least one photoactive alkenyl unsaturated group and hydrophobic polymer in aqueous solution containing diazoresin and water-soluble polybasic alcohol. The photosensitive resin composition is applied to the photosensitive film with superior aging stability and wide exposure latitude. |
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