Measurement system, method and litographic apparatus

A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of t...

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Bibliographische Detailangaben
Hauptverfasser:	MATTAAR THOMAS AUGUSTUS, PIETERSE MARTINUS THEODORUS JACOBUS, VERKOOIJEN ROB ANTONIUS ANDRIES, COX HENRIKUS HERMAN MARIE, KOENEN WILLEM HERMAN GERTRUDA ANNA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal, wherein the position quantity calculator includes a torsion estimator configured to estimate a torsion of the object, the position quantity calculator being configured to correct the determined position quantity of the object for the estimated torsion.