Vacuum pump for improving pumping speed and vacuum degree
The invention belongs to the technical field of pumps and relates to a vacuum pump for improving a pumping speed and a vacuum degree. The vacuum pump is characterized in that gas enters into a first stage pump chamber and is exhausted directly from a second stage pump chamber, and a pressure differe...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention belongs to the technical field of pumps and relates to a vacuum pump for improving a pumping speed and a vacuum degree. The vacuum pump is characterized in that gas enters into a first stage pump chamber and is exhausted directly from a second stage pump chamber, and a pressure difference and a gas flow resistance are small thus an overload of a pump is not caused; and the first stage pump chamber comprises a rotor 1, a rotor 2, an gas inlet chamber 3, a partition groove 4, a partition groove 5, a gas outlet chamber 6, a main shaft 7, a partition 8, a housing 9, a main shaft 10, a claw 11 of the rotor 1 and a claw 12 of the rotor 2. Compared with the existing vacuum pumps, the vacuum pump for improving a pumping speed and a vacuum degree overcomes the problems that a vacuum degree is reduced; an overload of a pump is caused easily and fluid trapping effects are produced when liquid exists, and has the advantage that an emptying rate, a liquid emission capability, a pumping speed and a vacuum deg |
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