Electrophoretic deposition apparatus and electrophoretic deposition method
The invention discloses an electrophoretic deposition method, comprising the following steps: providing an electrophoresis tank, an anode substrate and a cathode substrate; arranging the anode substrate and the cathode substrate in the electrophoresis tank; adjusting relative position of the anode s...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses an electrophoretic deposition method, comprising the following steps: providing an electrophoresis tank, an anode substrate and a cathode substrate; arranging the anode substrate and the cathode substrate in the electrophoresis tank; adjusting relative position of the anode substrate and the cathode substrate so as to enable distances between each section of the anode substrate to the corresponding section of the cathode substrate to be different; respectively inputting an anode voltage into anode electrodes on the anode substrate and a cathode voltage into cathode electrodes on the cathode substrate for electrophoretic deposition. According to the invention, distance distribution of plate electrodes is adjusted and a plurality of anode electrodes are employed to provide voltage distribution compensation; therefore, the problem existing in the prior art that uniformity of electrophoretic deposition rate is affected by uneven voltage distribution on cathode substrates because of shapes |
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