Mask image defection detection method and detection system thereof
The invention relates to a mask image defection detection method and a detection system thereof. The method comprises the following steps: step of obtaining a mask image-obtaining a mask image to be detected and a normal mask image; step of feature extraction and format conversion-extracting edge ch...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a mask image defection detection method and a detection system thereof. The method comprises the following steps: step of obtaining a mask image-obtaining a mask image to be detected and a normal mask image; step of feature extraction and format conversion-extracting edge characteristic and converted it as geometric figure format to be stored; step of filling-filling the blank area of the rectangular edge contour of the geometric figure; step of data merging-carrying out figure superposition; step of contour simulation-carrying out the contour simulation of wafer; step of critical dimensions analysis of the simulated contour-measuring the critical dimensions and calculating the difference of critical dimensions; and step of judge-judging whether the mask defection restoration is succeed or not through the difference of critical dimensions. The invention further relates to a mask image defection detection system. The method and system in the invention is simple and practicable, and has |
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