Method for concave and convex pattern formation and apparatus for manufacturing concave and convex pattern
Disclosed is a method for concave and convex pattern formation that is a nano-imprint process useful for the manufacture of electronic devices, optical components, recording media and the like, by which and can manufacture such products having a fine pattern can be manufactured at a low cost and hig...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Disclosed is a method for concave and convex pattern formation that is a nano-imprint process useful for the manufacture of electronic devices, optical components, recording media and the like, by which and can manufacture such products having a fine pattern can be manufactured at a low cost and high-speed. The method is characterized by comprising a step of mounting the surface of a stamper having a fine concave and convex pattern onto a photo-curable transfer and then pressing the stamper to form a laminate; a step of curing the transfer layer in the laminate with the stamper by ultraviolet irradiation and then removing the stamper to obtain an intermediate stamper having a fine reverse concave and convex pattern on the surface of the transfer layer; a step of mounting the intermediate stamper onto a photo-curable transfer and then pressing the intermediate stamper to form a laminate; and a step of curing the transfer layer in the laminate including the intermediate stamper by ultraviolet irradiation and th |
---|