Method for concave and convex pattern formation and apparatus for manufacturing concave and convex pattern

Disclosed is a method for concave and convex pattern formation that is a nano-imprint process useful for the manufacture of electronic devices, optical components, recording media and the like, by which and can manufacture such products having a fine pattern can be manufactured at a low cost and hig...

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Bibliographische Detailangaben
Hauptverfasser: KAIDA EIZOU, INAMIYA TAKATO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Disclosed is a method for concave and convex pattern formation that is a nano-imprint process useful for the manufacture of electronic devices, optical components, recording media and the like, by which and can manufacture such products having a fine pattern can be manufactured at a low cost and high-speed. The method is characterized by comprising a step of mounting the surface of a stamper having a fine concave and convex pattern onto a photo-curable transfer and then pressing the stamper to form a laminate; a step of curing the transfer layer in the laminate with the stamper by ultraviolet irradiation and then removing the stamper to obtain an intermediate stamper having a fine reverse concave and convex pattern on the surface of the transfer layer; a step of mounting the intermediate stamper onto a photo-curable transfer and then pressing the intermediate stamper to form a laminate; and a step of curing the transfer layer in the laminate including the intermediate stamper by ultraviolet irradiation and th