Novel compound and radiation sensitive composition comprising the same

The present invention provides a novel compound and a radiation-sensitive composition. The novel compound not only has low sublimation property, high radiation sensitivity when being used as photo-polymerization initiator but also has excellent solubility. The radiation-sensitive composition can for...

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Bibliographische Detailangaben
Hauptverfasser:	ICHINOHE DAIGO, IWASAWA HARUKI
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention provides a novel compound and a radiation-sensitive composition. The novel compound not only has low sublimation property, high radiation sensitivity when being used as photo-polymerization initiator but also has excellent solubility. The radiation-sensitive composition can form cured film having high surface hardness and transparency. The first type of the present invention is a compound represented by formula (1). The second type of the present invention is a radiation-sensitive composition containing [A] said compound as photo-polymerization initiator and [B] polymerizable compound having ethylenically unsaturated double bond. The radiation-sensitive composition preferably contains [C] alkali-soluble resin additionally.