Device and method for substrate analysis

The invention discloses a device and a method for substrate analysis. The substrate analysis device is a small and simple device capable of carrying out an etching process and a recovery process and enables analysis of films formed on a substrate regardless of the type of the films and local analysis of the substrate. The substrate analysis device comprises a nozzle body for sending or sucking out analysis liquid and a double-pipe nozzle formed by external pipes arranged on the periphery of the nozzle body. The recovery means is the nozzle body of the double-pipe nozzle, and the etching means is the etching gas supplied to a place between the nozzle body and the external pipes. The substrate analysis device also comprises a gas charging means which is a gas charging path arranged between the nozzle body and the external pipes which is arranged in an enclosing manner for sweeping analysis liquid and provided with extraneous gas inlet hole at the front end. According to the invention, the etching process and th