Method for cleaning polymer in semiconductor

The invention discloses a method for cleaning a polymer in a semiconductor, which belongs to the field of semiconductor manufacturing, and aims to avoid the phenomenon that white traces are generated on an aluminum sheet when the polymer is cleaned during manufacturing of the semiconductor at present. The method comprises the following steps of: placing the semiconductor on which the polymer is remained into a washing trough; spraying water upward from the bottom of the washing trough until the water is overflowed to ensure that the water keeps overflowing from the washing trough for predetermined time, and discharging the water; and spraying water upward from the bottom of the washing trough and simultaneously spraying water to the semiconductor from the top of the washing trough until the washing trough is full of water, and discharging the water, wherein the water is deionized water. The method can be used for cleaning the polymer retained in the semiconductor during manufacturing of the semiconductor.