Repair regeneration method of reference piece for heavy metal pollution for silicon wafer and regeneration solution

The invention relates to a repair and regeneration solution of a heavy metal polluted testing reference piece for a silicon wafer. The solution comprises a solution A, a solution D, a solution B and a solution C, wherein the solution A is 30wt% hydrogen peroxide; the solution D is a dissolved solution of aluminium potassium sulfate dodecahydrate in H2SO4; 0.15-0.21g of aluminium potassium sulfatedodecahydrate is dissolved in 100ml of H2SO4; the solution B is mixed liquor of fluorinated ammonia and hydrofluoric acid; 140-200ml of hydrofluoric acid is mixed in 1000ml of fluorinated ammonia; the solution C is aqueous solution of hydrofluoric acid; and 230-300ml of hydrofluoric acid is added to 1000ml of water. The invention also provides a relevant repair and regeneration method. The solution and the method have the following beneficial effects: the design is unique; the operation is simple and convenient; the effect is obvious; the problem of retreatment and reuse of the testing reference piece after pollution