Lithographic apparatus having parts with a coated film adhered thereto

The invention discloses a lithographic apparatus having parts with a coated film adhered thereto. The lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement stru...

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Hauptverfasser: LOOPSTRA ERIK ROELOF, STEFFENS KOEN, DIRECKS DANIEL JOZEF MARIA, SIMONS WILHELMUS FRANCISCUS JO, FIEN MENNO, VAN DER HAM RONALD, BRANDS GERT-JAN GERARDUS JOHAN, LIEBREGTS PAULUS MARTINUS MARI, JANSSEN FRANCISCUS JOHANNES JO
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creator LOOPSTRA ERIK ROELOF
STEFFENS KOEN
DIRECKS DANIEL JOZEF MARIA
SIMONS WILHELMUS FRANCISCUS JO
FIEN MENNO
VAN DER HAM RONALD
BRANDS GERT-JAN GERARDUS JOHAN
LIEBREGTS PAULUS MARTINUS MARI
JANSSEN FRANCISCUS JOHANNES JO
description The invention discloses a lithographic apparatus having parts with a coated film adhered thereto. The lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN102073223A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN102073223A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN102073223A3</originalsourceid><addsrcrecordid>eNrjZHDzySzJyE8vSizIyExWSCwoSCxKLCktVshILMvMS1cAckuKFcqBahQSFZLzE0tSUxTSMnNyFRJTMlKLgJwSEFWSz8PAmpaYU5zKC6W5GRTdXEOcPXRTC_LjU4sLEpNT81JL4p39DA2MDMyNjYyMHY2JUQMAPd8ziA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus having parts with a coated film adhered thereto</title><source>esp@cenet</source><creator>LOOPSTRA ERIK ROELOF ; STEFFENS KOEN ; DIRECKS DANIEL JOZEF MARIA ; SIMONS WILHELMUS FRANCISCUS JO ; FIEN MENNO ; VAN DER HAM RONALD ; BRANDS GERT-JAN GERARDUS JOHAN ; LIEBREGTS PAULUS MARTINUS MARI ; JANSSEN FRANCISCUS JOHANNES JO</creator><creatorcontrib>LOOPSTRA ERIK ROELOF ; STEFFENS KOEN ; DIRECKS DANIEL JOZEF MARIA ; SIMONS WILHELMUS FRANCISCUS JO ; FIEN MENNO ; VAN DER HAM RONALD ; BRANDS GERT-JAN GERARDUS JOHAN ; LIEBREGTS PAULUS MARTINUS MARI ; JANSSEN FRANCISCUS JOHANNES JO</creatorcontrib><description>The invention discloses a lithographic apparatus having parts with a coated film adhered thereto. The lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110525&amp;DB=EPODOC&amp;CC=CN&amp;NR=102073223A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110525&amp;DB=EPODOC&amp;CC=CN&amp;NR=102073223A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LOOPSTRA ERIK ROELOF</creatorcontrib><creatorcontrib>STEFFENS KOEN</creatorcontrib><creatorcontrib>DIRECKS DANIEL JOZEF MARIA</creatorcontrib><creatorcontrib>SIMONS WILHELMUS FRANCISCUS JO</creatorcontrib><creatorcontrib>FIEN MENNO</creatorcontrib><creatorcontrib>VAN DER HAM RONALD</creatorcontrib><creatorcontrib>BRANDS GERT-JAN GERARDUS JOHAN</creatorcontrib><creatorcontrib>LIEBREGTS PAULUS MARTINUS MARI</creatorcontrib><creatorcontrib>JANSSEN FRANCISCUS JOHANNES JO</creatorcontrib><title>Lithographic apparatus having parts with a coated film adhered thereto</title><description>The invention discloses a lithographic apparatus having parts with a coated film adhered thereto. The lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDzySzJyE8vSizIyExWSCwoSCxKLCktVshILMvMS1cAckuKFcqBahQSFZLzE0tSUxTSMnNyFRJTMlKLgJwSEFWSz8PAmpaYU5zKC6W5GRTdXEOcPXRTC_LjU4sLEpNT81JL4p39DA2MDMyNjYyMHY2JUQMAPd8ziA</recordid><startdate>20110525</startdate><enddate>20110525</enddate><creator>LOOPSTRA ERIK ROELOF</creator><creator>STEFFENS KOEN</creator><creator>DIRECKS DANIEL JOZEF MARIA</creator><creator>SIMONS WILHELMUS FRANCISCUS JO</creator><creator>FIEN MENNO</creator><creator>VAN DER HAM RONALD</creator><creator>BRANDS GERT-JAN GERARDUS JOHAN</creator><creator>LIEBREGTS PAULUS MARTINUS MARI</creator><creator>JANSSEN FRANCISCUS JOHANNES JO</creator><scope>EVB</scope></search><sort><creationdate>20110525</creationdate><title>Lithographic apparatus having parts with a coated film adhered thereto</title><author>LOOPSTRA ERIK ROELOF ; STEFFENS KOEN ; DIRECKS DANIEL JOZEF MARIA ; SIMONS WILHELMUS FRANCISCUS JO ; FIEN MENNO ; VAN DER HAM RONALD ; BRANDS GERT-JAN GERARDUS JOHAN ; LIEBREGTS PAULUS MARTINUS MARI ; JANSSEN FRANCISCUS JOHANNES JO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN102073223A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2011</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>LOOPSTRA ERIK ROELOF</creatorcontrib><creatorcontrib>STEFFENS KOEN</creatorcontrib><creatorcontrib>DIRECKS DANIEL JOZEF MARIA</creatorcontrib><creatorcontrib>SIMONS WILHELMUS FRANCISCUS JO</creatorcontrib><creatorcontrib>FIEN MENNO</creatorcontrib><creatorcontrib>VAN DER HAM RONALD</creatorcontrib><creatorcontrib>BRANDS GERT-JAN GERARDUS JOHAN</creatorcontrib><creatorcontrib>LIEBREGTS PAULUS MARTINUS MARI</creatorcontrib><creatorcontrib>JANSSEN FRANCISCUS JOHANNES JO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LOOPSTRA ERIK ROELOF</au><au>STEFFENS KOEN</au><au>DIRECKS DANIEL JOZEF MARIA</au><au>SIMONS WILHELMUS FRANCISCUS JO</au><au>FIEN MENNO</au><au>VAN DER HAM RONALD</au><au>BRANDS GERT-JAN GERARDUS JOHAN</au><au>LIEBREGTS PAULUS MARTINUS MARI</au><au>JANSSEN FRANCISCUS JOHANNES JO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus having parts with a coated film adhered thereto</title><date>2011-05-25</date><risdate>2011</risdate><abstract>The invention discloses a lithographic apparatus having parts with a coated film adhered thereto. The lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.</abstract><oa>free_for_read</oa></addata></record>
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language chi ; eng
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Lithographic apparatus having parts with a coated film adhered thereto
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-23T20%3A49%3A41IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LOOPSTRA%20ERIK%20ROELOF&rft.date=2011-05-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN102073223A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true