Plasma system with introducing device

The invention discloses a plasma system with an introducing device. The plasma system comprises a plasma cavity and an introducing device, wherein the plasma cavity comprises a first electrode and a second electrode; the first electrode and the second electrode are used for generating plasma; the introducing device comprises a plasma introducing pipe and a reactant introducing pipe; the plasma introducing pipe is coupled with the plasma cavity and provided with an inlet, an outlet and an outer side wall; the plasma introducing pipe introduces the plasma from the inlet and delivers the plasma out from the outlet; the width of the outer side wall is gradually reduced from the position adjacent to the inlet toward the position adjacent to the outlet; and the reactant introducing pipe is arranged outside the outer side wall and used for introducing a reactant to the outer side wall, so that the reactant flows along the outer side wall toward the outlet and is mixed with the plasma at the outlet.